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Exploring surface doping and adsorption in semiconducting systems using a high throughput ab initio methodology for applications in nanoelectronics and photonics

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Fri, 07/03/2014 - 15:26 -- Ward

Description 

Exploring surface doping and adsorption in semiconducting systems using a high throughput ab initio methodology for applications in nanoelectronics and photonics

Period 

Friday, 1 November, 2013 to Friday, 28 February, 2014

Node days 

4 680.00 days

Users

M. Sluydts, D.E.P. Vanpoucke

Remaining days 

0.00 days

Status 

Approved

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